Rolled Copper foils for Graphene
HA/HA-V2/TPC foil (tough pitch copper foil)
Characteristics
- A rolled copper foil designed to have large crystal grains and well-aligned crystal orientation.
- Compared to conventional copper foils, it has lower roughness and contains minimal impurities.
- With fewer stacking faults, it enables the production of high-quality monolayer graphene.
- Available in roll form, making it ideal for roll-to-roll graphene production processes.
Application
- Can be used as a substrate for graphene growth in the CVD (Chemical Vapor Deposition) process.
- CVD graphene is increasingly being adopted in applications such as sensors, batteries, transparent conductors, and transparent heating elements.
Feature
Improvement of crystal orientation
HA and HA-V2 foils are designed to have large crystals after annealing, with a significantly high crystal orientation in the [100] direction. These characteristics influence the epitaxial growth of graphene, enabling the production of high-quality graphene.
EBSP views of copper foil surfaces showing differences in crystal grain orientation
Chemical composition
| ProductSeries | HA | HA-V2 | TPC |
|---|---|---|---|
| Cu | ≧99.9% | ≧99.9% | ≧99.9% |
| Ag | 190ppm | 100ppm | - |
Contact Information
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