Sputtering Targets for Optical Films
Our proprietary low-refractivity target, offering the following features.
- Low-refractivity, high-transmittance film can be deposited at a fast rate by DC sputtering.
- High-transmittance film is formed without use of oxygen.
- The target offers outstanding amorphous stability and barrier performance. It is suited for use as protective film of various kinds.
NS-LR Series basic properties
|Target name||DC sputtering||Atmosphere||Sputtering rate||n||k|
|NS-LR-C3J-2 (under development)||OK||Ar||1.72||1.65||0.000||0.000|
|MgO (for reference)||NG||Ar||0.15||1.74||-||-|
Water vapor transmission rate (WVTR, measured by MOCON analyzer)
Barrier properties are superior to those of SiO2.
A film with high transmittance up to the ultraviolet region is obtained.
Thermal resistance (NS-LR-C3J)
|Annealing temperature (℃)||n||k||Sheet resistance||Film property (XRD)|
Properties do not vary, even at high temperatures.
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