Sputtering Targets for Optical Films
NS-LR Series
(Low-Refractivity Target)
Features
Our proprietary low-refractivity target, offering the following features.
- Low-refractivity, high-transmittance film can be deposited at a fast rate by DC sputtering.
- High-transmittance film is formed without use of oxygen.
- The target offers outstanding amorphous stability and barrier performance. It is suited for use as protective film of various kinds.
NS-LR Series basic properties
| Target name | DC sputtering | Atmosphere | Sputtering rate | n | k | |
|---|---|---|---|---|---|---|
| Å/sec | 550nm | 405nm | 550nm | |||
| NS-LR-C3J | OK | Ar | 1.94 | 1.74 | 0.001 | 0.000 |
| 2%O2 | 1.66 | 1.70 | 0.000 | 0.000 | ||
| NS-LR-C3J-2 (under development) | OK | Ar | 1.72 | 1.65 | 0.000 | 0.000 |
| 2%O2 | (pending) | |||||
| MgO (for reference) | NG | Ar | 0.15 | 1.74 | - | - |
Water vapor transmission rate (WVTR, measured by MOCON analyzer)
Barrier properties are superior to those of SiO2.
Optical transmittance
A film with high transmittance up to the ultraviolet region is obtained.
Thermal resistance (NS-LR-C3J)
| Annealing temperature (℃) | n | k | Sheet resistance | Film property (XRD) |
|---|---|---|---|---|
| 550nm | 405nm | (Ω/sq) | ||
| R.T | 1.74 | 0.000 | >5000k | Amorphous |
| 240 | 1.73 | 0.000 | >5000k | Amorphous |
| 400 | 1.73 | 0.000 | >5000k | Amorphous |
Properties do not vary, even at high temperatures.
Contact Information
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