Sputtering Targets

Sputtering Targets for Display (OLED, TFT)

ITO (indium tin oxide) is one of the few materials with both transparency and electrical conductivity. Because of the high conductivity, transparency, and durability, ITO films manufactured by the sputtering method are widely used for transparent electrodes for LCD, OLED, touch panels, and other types of flat panel displays, as well as for photovoltaic cells.
The extensive product lineup includes IZO (Indium-Zinc-Oxide) target for amorphous transparent conductive films, with its excellent surface smoothness and etching properties, IGZO (Indium-Gallium-Zinc-Oxide) target for oxide semiconductors, seen as a promising next-generation TFT semiconductor material, and Rotary type targets with high usage rate

Main Products

ITO Sputtering Target, IZO Sputtering Target, IGZO Sputtering Target, etc.


Excellent sputtering properties
High-density, low nodule target mass production technology established over a history of development and production
Large tile size
The use of large tiles results in fewer divisions among the tiles making up the target, helping to reduce particles
Stable supply
Abundant production capacity at three manufacturing sites (in Japan, South Korea, and Taiwan), which is supported by the raw material supply capability
Rotary type
All products can be manufactured as Rotary targets with high usage rate

Technology and Properties

Manufacturing sites
Isohara Works (Ibaraki Prefecture), Pyeongtaek Plant (South Korea), Longtan Works (Taiwan)
Marketing and business offices
Tokyo, South Korea, Taiwan, China, Germany, USA
Products handled
Targets for transparent conductive films
Targets for oxide semiconductors
Our equipment
(examples) Deposition systems, film inspection systems
Quality system (certified)
All plants have acquired ISO 9001 certification.


  • LCD panel displays
  • OLED displays
  • Touch panels
  • Photovoltaic cells
Contact Information
From the Web

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