Sputtering Targets for Display (OLED, TFT)
ITO (indium tin oxide) is one of the few materials with both transparency and electrical conductivity. Because of the high conductivity, transparency, and durability, ITO films manufactured by the sputtering method are widely used for transparent electrodes for LCD, OLED, touch panels, and other types of flat panel displays, as well as for photovoltaic cells.
The extensive product lineup includes IZO (Indium-Zinc-Oxide) target for amorphous transparent conductive films, with its excellent surface smoothness and etching properties, IGZO (Indium-Gallium-Zinc-Oxide) target for oxide semiconductors, seen as a promising next-generation TFT semiconductor material, and Rotary type targets with high usage rate
Main Products
ITO Sputtering Target, IZO Sputtering Target, IGZO Sputtering Target, etc.
Features
- Excellent sputtering properties
- High-density, low nodule target mass production technology established over a history of development and production
- Large tile size
- The use of large tiles results in fewer divisions among the tiles making up the target, helping to reduce particles
- Stable supply
- Abundant production capacity at three manufacturing sites (in Japan, South Korea, and Taiwan), which is supported by the raw material supply capability
- Rotary type
- All products can be manufactured as Rotary targets with high usage rate
Technology and Properties
- Manufacturing sites
- Isohara Works (Ibaraki Prefecture), Pyeongtaek Plant (South Korea), Longtan Works (Taiwan)
- Marketing and business offices
- Tokyo, South Korea, Taiwan, China, Germany, USA
- Products handled
- Targets for transparent conductive films
Targets for oxide semiconductors
- Our equipment
- (examples) Deposition systems, film inspection systems
- Quality system (certified)
- All plants have acquired ISO 9001 certification.
Applications
- LCD panel displays
- OLED displays
- Touch panels
- Photovoltaic cells
Inquiries accepted 24 hours a day