Sputtering Targets for Flat Panel Displays
ITO (Indium Tin Oxide) Sputtering Target
Features
Leveraging the advantage of our full-process production starting from raw materials, we produce and sell high-density, low-particle ITO targets as UHD (Ultra High Density)-IV Grade using indium oxide and tin oxide made by electrolysis. In addition to the standard product with tin oxide density of 10wt%, we can provide products with lower tin oxide density. These are well suited to film deposition, since low-resistivity film can be deposited without high temperature annealing. With rotary targets as well, particle levels can be minimized by using large cylinders for fewer divisions.
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Applications
Transparent conductive films
Technology and Properties
Purity | 4N |
---|---|
Shapes | All sputtering equipment and all sizes can be manufactured, whether for rotary or planar type. |
Composition | Needs for various compositions can be met (Standard tin oxide concentration 10wt%.) |
Contact Information
From the Web
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